Reflective photomasks and methods of determining layer...

Details Reflective photomasks and methods of determining layer... Reflective photomasks and methods of determining layer...

2011-04-19

2011-04-19

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07927767

ABSTRACT:
A reflective photomask and a method of determining or optimizing thicknesses of layers of the reflective photomask are provided. The reflective photomask may include a substrate, a reflective layer, an absorptive pattern, and a spacer. The substrate may include a reflective region and an absorptive region, the reflective layer may be formed between the reflective and absorptive regions, the absorptive pattern may be formed on the reflective layer corresponding to the reflective region, and the spacer may be formed at an upper portion, lower portion, or inside of the reflective layer so as to correspond to the reflective region.

REFERENCES:
patent: 6627362 (2003-09-01), Stivers et al.
patent: 6645679 (2003-11-01), La Fontaine et al.
patent: 7682758 (2010-03-01), Kim et al.
patent: 2005/0084768 (2005-04-01), Han et al.
patent: 2005/0208390 (2005-09-01), Xiao
patent: 1020060069610 (2006-06-01), None

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