Reflective photomask and method of fabricating the same

Details Reflective photomask and method of fabricating the same Reflective photomask and method of fabricating the same

2007-01-23

2010-10-05

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S394000

Reexamination Certificate

active

07807318

ABSTRACT:
A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.

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Korean Notice of Allowance dated May 30, 2007.
Korean Notice of Examination Report dated Nov. 18, 2006.

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