Reflective optical element and EUV lithography appliance

Details Reflective optical element and EUV lithography appliance Reflective optical element and EUV lithography appliance

2011-05-31

2011-05-31

Allen, Stephone B (Department: 2872)

Optical: systems and elements

Having significant infrared or ultraviolet property

Multilayer filter or multilayer reflector

C359S361000, C359S584000, C359S589000, C359S884000

Reexamination Certificate

active

07952797

ABSTRACT:
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.

REFERENCES:
patent: 4958363 (1990-09-01), Nelson et al.
patent: 5958605 (1999-09-01), Montcalm et al.
patent: 6157486 (2000-12-01), Benson et al.
patent: 6228512 (2001-05-01), Bajt et al.
patent: 6449086 (2002-09-01), Singh
patent: 6937334 (2005-08-01), Monshouwer et al.
patent: 2005/0087699 (2005-04-01), Miyake
patent: 2006/0076516 (2006-04-01), Wedowski
patent: 2008/0204861 (2008-08-01), Shiraishi
patent: 0 708 367 (1996-04-01), None
patent: 0 922 996 (1999-06-01), None
patent: 0 824 721 (2000-07-01), None
patent: 1 260 861 (2002-11-01), None
patent: 03 032329 (2003-04-01), None
patent: WO 03032329 (2003-04-01), None
Singh et al., “Capping layers for extreme-ultraviolet multilayer interference coatings”, Optics Letters, Optical Society of America, Washington, XP-002219427, vol. 26, No. 5, pp. 259-261, Mar. 1, 2001.
Malinowski et al., “Controlling Contamination in Mo/Si Multilayer Mirrors by Si Surface-capping Modifications”, Proceedings of SPIE, XP008042287, vol. 4688, 2002, pp. 442-453.
M. Singh “Capping layers for extreme-ultraviolet multilayer interference coatings” Optics Letters, Mar. 1, 2001, vol. 26, No. 5, pp. 259-261.
Oesterreich et al.: Multilayer reflectance during exposure to EUV radiation, Soft X-Ray and EUV Imaging Systems, SPIE vol. 4146, XP002289630, pp. 64-71, 2000.

Affiliated with

Also associated with

Rating

Reflective optical element and EUV lithography appliance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflective optical element and EUV lithography appliance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflective optical element and EUV lithography appliance will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2639390