Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-01-17
2006-01-17
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
06986971
ABSTRACT:
An EUV mask (10) includes an opening (26) that helps to attenuate and phase shift extreme ultraviolet radiation using a subtractive rather than additive method. An etch stop layer (20) may be provided between a lower multilayer reflective stack (14) and an upper multilayer reflective stack (22) to ensure an appropriate and accurate depth of the opening. An absorber layer (32) may be deposited within the opening to sufficiently reduce the amount of reflection within dark region (30). Optimal thicknesses and locations of the various layers are described.
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Han Sang-In
Hector Scott Daniel
Mangat Pawitter J. S.
Freescale Semiconductor Inc.
Goddard Patricia S.
Rosasco S.
Vo Kim-Marie
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