Reflective mask blank having a programmed defect and method...

Details Reflective mask blank having a programmed defect and method... Reflective mask blank having a programmed defect and method...

2007-10-16

2007-10-16

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10789990

ABSTRACT:
A reflective mask blank has a substrate (1) and a reflective multilayer film (3) formed on the substrate to reflect exposure light. The substrate has a base pattern (2) formed by a predetermined irregularity. On a surface of the reflective multilayer film formed on the base pattern, a step portion corresponding to the base pattern is formed as a programmed defect.

REFERENCES:
patent: 6042995 (2000-03-01), White
patent: 6641959 (2003-11-01), Yan
patent: 6723475 (2004-04-01), Tsukamoto et al.
patent: 7045254 (2006-05-01), Dettmann et al.
patent: 7-333829 (1995-12-01), None
patent: 8-213303 (1996-08-01), None

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