X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate
2006-07-04
2006-07-04
Bruce, David V. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Lithography
C378S034000
Reexamination Certificate
active
07072438
ABSTRACT:
A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
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Chiba Keiko
Hara Shin-ichi
Maehara Hiroshi
Tsukamoto Masami
Watanabe Yutaka
Bruce David V.
Song Hoon
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