Reflection type mask

X-ray or gamma ray systems or devices – Specific application – Lithography

Reexamination Certificate

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Details

C378S034000

Reexamination Certificate

active

07072438

ABSTRACT:
A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.

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