Reflection device

Details Reflection device Reflection device

1992-05-26

1993-01-26

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378145, G21K 510

Patent

active

051827638

ABSTRACT:
Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.

REFERENCES:
patent: 4429411 (1984-01-01), Smither
patent: 4698833 (1987-10-01), Keen et al.
patent: 4714308 (1987-12-01), Sawamura et al.
patent: 4785470 (1988-11-01), Wood et al.
patent: 4882780 (1989-11-01), Wittny
patent: 4916721 (1990-04-01), Carr et al.
patent: 4969175 (1990-11-01), Nelson et al.
patent: 5052033 (1991-09-01), Ikeda et al.
Patent Abstracts of Japan, Kokai No. 59-220707, vol. 9, No. 93, Apr. 1985.
Fujii, et al., "A Computer-Controlled System for an Oscillation Mirror and Exposure Shutter," Summ. of Japanese Appl. Phys., Spring 1988, 31a-k-9.

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