Reflecting mask, apparatus for fixing the reflecting mask...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07855034

ABSTRACT:
In a reflecting mask, an apparatus for fixing the reflecting mask and a method of fixing the reflecting mask, voltages are applied to elements of a conductive pattern spaced apart from each other on a rear face of the reflecting mask to fix the reflecting mask by using electrostatic forces. A flatness of the fixed reflecting mask is measured, and the electrostatic forces provided to portions of the reflecting mask are selectively adjusted in accordance with a measured result obtained from the measuring part, such that the reflecting mask is horizontally fixed and is substantially flat.

REFERENCES:
patent: 6352803 (2002-03-01), Tong et al.
patent: 7092231 (2006-08-01), Hoeks et al.
patent: 7623334 (2009-11-01), Mizuno et al.
patent: 2002-299228 (2002-10-01), None
patent: 2005-210093 (2005-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reflecting mask, apparatus for fixing the reflecting mask... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflecting mask, apparatus for fixing the reflecting mask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflecting mask, apparatus for fixing the reflecting mask... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4191113

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.