Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-12-19
2006-12-19
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C382S144000, C430S005000
Reexamination Certificate
active
07152219
ABSTRACT:
A reference image is generated from a subject image of at least a portion of a photolithography mask to enable a photolithography mask inspection and analysis system that otherwise cannot generate a reference image from a reference die or digitized design data, for example, to perform a mask analysis using the reference image. A mask inspection and analysis system may then be enhanced to perform one or more additional mask analyses to analyze the mask. The reference image is generated by identifying a defect or contaminant of the mask in the subject image and modifying the subject image to remove the defect or contaminant from the mask to generate the reference image. For one embodiment, a system using a STARlight inspection tool that captures transmitted and reflected images of a portion of a mask may then be enhanced to perform one or more mask analyses that use a reference image.
REFERENCES:
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6282309 (2001-08-01), Emery
patent: 6757645 (2004-06-01), Chang et al.
Bever Hoffman & Harms LLP
Dinh Paul
Harms Jeanette S.
Synopsys Inc.
LandOfFree
Reference image generation from subject image for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reference image generation from subject image for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reference image generation from subject image for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3692343