Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2011-04-05
2011-04-05
Bryant, Kiesha R (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257S758000, C257SE23161
Reexamination Certificate
active
07919862
ABSTRACT:
An integrated circuit structure having improved resistivity and a method for forming the same are provided. The integrated circuit structure includes a dielectric layer, an opening in the dielectric layer, an oxide-based barrier layer directly on sidewalls of the opening, and conductive materials filling the remaining portion of the opening.
REFERENCES:
patent: 5130274 (1992-07-01), Harper et al.
patent: 5659201 (1997-08-01), Wollesen
patent: 6211075 (2001-04-01), Liu et al.
patent: 6294832 (2001-09-01), Yeh et al.
patent: 6420189 (2002-07-01), Lopatin
patent: 6433379 (2002-08-01), Lopatin et al.
patent: 6465867 (2002-10-01), Bernard et al.
patent: 6589329 (2003-07-01), Baum et al.
patent: 6713373 (2004-03-01), Omstead
patent: 6803310 (2004-10-01), Wang et al.
patent: 6846739 (2005-01-01), Cathey et al.
patent: 6936535 (2005-08-01), Kim et al.
patent: 6951812 (2005-10-01), Jiang et al.
patent: 6958547 (2005-10-01), Dubin et al.
patent: 7008872 (2006-03-01), Dubin et al.
patent: 7037836 (2006-05-01), Lee
patent: 7179759 (2007-02-01), Huang et al.
patent: 7612451 (2009-11-01), Shih et al.
patent: 2001/0031539 (2001-10-01), Uhlenbrock et al.
patent: 2002/0022334 (2002-02-01), Yang et al.
patent: 2002/0024139 (2002-02-01), Chan et al.
patent: 2003/0183940 (2003-10-01), Noguchi et al.
patent: 2003/0207560 (2003-11-01), Dubin et al.
patent: 2003/0207561 (2003-11-01), Dubin et al.
patent: 2004/0043333 (2004-03-01), Keller
patent: 2004/0147115 (2004-07-01), Goundar et al.
patent: 2006/0019485 (2006-01-01), Komai et al.
patent: 2007/0161128 (2007-07-01), Ueno
patent: 2008/0012133 (2008-01-01), Shih et al.
patent: 2008/0286965 (2008-11-01), Lee et al.
patent: 1185033 (1998-06-01), None
patent: 1438691 (2003-08-01), None
patent: 1623228 (2005-06-01), None
patent: 1755914 (2006-04-01), None
patent: 2000-252285 (2000-09-01), None
patent: 2004/0064977 (2004-07-01), None
Prater, W. L., et al., “Reduction of Resistivity in Cu Thin Films by Partial Oxidation: Microstructural Mechanisms,” Applied Physics Letters, vol. 84, No. 14, Apr. 5, 2004, pp. 2518-2520.
Bryant Kiesha R
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
Wright Tucker
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