Reducing resistivity in interconnect structures of...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S758000, C257SE23161

Reexamination Certificate

active

07919862

ABSTRACT:
An integrated circuit structure having improved resistivity and a method for forming the same are provided. The integrated circuit structure includes a dielectric layer, an opening in the dielectric layer, an oxide-based barrier layer directly on sidewalls of the opening, and conductive materials filling the remaining portion of the opening.

REFERENCES:
patent: 5130274 (1992-07-01), Harper et al.
patent: 5659201 (1997-08-01), Wollesen
patent: 6211075 (2001-04-01), Liu et al.
patent: 6294832 (2001-09-01), Yeh et al.
patent: 6420189 (2002-07-01), Lopatin
patent: 6433379 (2002-08-01), Lopatin et al.
patent: 6465867 (2002-10-01), Bernard et al.
patent: 6589329 (2003-07-01), Baum et al.
patent: 6713373 (2004-03-01), Omstead
patent: 6803310 (2004-10-01), Wang et al.
patent: 6846739 (2005-01-01), Cathey et al.
patent: 6936535 (2005-08-01), Kim et al.
patent: 6951812 (2005-10-01), Jiang et al.
patent: 6958547 (2005-10-01), Dubin et al.
patent: 7008872 (2006-03-01), Dubin et al.
patent: 7037836 (2006-05-01), Lee
patent: 7179759 (2007-02-01), Huang et al.
patent: 7612451 (2009-11-01), Shih et al.
patent: 2001/0031539 (2001-10-01), Uhlenbrock et al.
patent: 2002/0022334 (2002-02-01), Yang et al.
patent: 2002/0024139 (2002-02-01), Chan et al.
patent: 2003/0183940 (2003-10-01), Noguchi et al.
patent: 2003/0207560 (2003-11-01), Dubin et al.
patent: 2003/0207561 (2003-11-01), Dubin et al.
patent: 2004/0043333 (2004-03-01), Keller
patent: 2004/0147115 (2004-07-01), Goundar et al.
patent: 2006/0019485 (2006-01-01), Komai et al.
patent: 2007/0161128 (2007-07-01), Ueno
patent: 2008/0012133 (2008-01-01), Shih et al.
patent: 2008/0286965 (2008-11-01), Lee et al.
patent: 1185033 (1998-06-01), None
patent: 1438691 (2003-08-01), None
patent: 1623228 (2005-06-01), None
patent: 1755914 (2006-04-01), None
patent: 2000-252285 (2000-09-01), None
patent: 2004/0064977 (2004-07-01), None
Prater, W. L., et al., “Reduction of Resistivity in Cu Thin Films by Partial Oxidation: Microstructural Mechanisms,” Applied Physics Letters, vol. 84, No. 14, Apr. 5, 2004, pp. 2518-2520.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reducing resistivity in interconnect structures of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reducing resistivity in interconnect structures of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reducing resistivity in interconnect structures of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2718569

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.