Chemistry of inorganic compounds – Silicon or compound thereof – Elemental silicon
Patent
1984-04-02
1985-12-17
Doll, John
Chemistry of inorganic compounds
Silicon or compound thereof
Elemental silicon
423348, 423349, C01B 3302
Patent
active
045592195
ABSTRACT:
A method of manipulating the rate of homogeneous nucleation of silicon as either a particulate solid or liquid settling out of the gaseous phase during the pyrolysis of silane homologs by controlling the quantity of halogen within the pyrolysis medium. The rate of homogeneous nucleation can be maintained sufficiently low (below 1 silicon nucleus/cm.sup.3 /sec) so as to avoid power formation with a minimum amount of halogen.
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patent: 4125643 (1978-11-01), Reuschel et al.
patent: 4147814 (1979-04-01), Yatsurugi et al.
patent: 4150168 (1979-04-01), Yatsurugi et al.
J. Bloem; Journal of Crystal Growth 18, (1973), pp. 70-76.
Carlyle S. Herrick and David W. Woodruff, "The Homogenous Nucleation of Condensed Silicon in the Gaseous Si--H--Cl System", J. of the Electrochemical Society, vol. 131, No. 10, Oct. 1984, pp. 2417-2422.
Davis Jr. James C.
Doll John
General Electric Company
Leeds Jackson
Magee Jr. James
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