Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1980-08-18
1982-04-06
Newsome, John H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
427 39, 427 431, 430296, 430942, B05D 306
Patent
active
043236383
ABSTRACT:
In a charged-particle-beam lithographic system, charge accumulation on the workpiece during alignment or writing can cause significant pattern placement errors. A film (16) formed directly under the resist layer (56) to be patterned is utilized as a charge-conducting medium during lithography. The pattern delineated in the resist layer (56) is transferred into the film (16) and subsequently into an underlying layer (20). The film (16) is highly compatible with standard lithographic and etching processes used to fabricate LSI and VLSI circuits.
REFERENCES:
patent: 3689768 (1972-09-01), Sato et al.
patent: 3949131 (1976-04-01), Fraser
patent: 4224733 (1980-09-01), Spadea
"Bell System Tech. Jour.", vol. 58, No. 5, May-Jun. 1979, pp. 1027-1036.
Adams Arthur C.
Alexander, Jr. Frank B.
Levinstein Hyman J.
Thibault Louis R.
Bell Telephone Laboratories Incorporated
Canepa Lucian C.
Newsome John H.
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