Reduced pressure drying apparatus and reduced pressure...

Details Reduced pressure drying apparatus and reduced pressure... Reduced pressure drying apparatus and reduced pressure...

2005-02-25

2008-03-18

Rinehart, Kenneth (Department: 3749)

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

C034S570000, C034S487000, C118S715000, C700S121000

Reexamination Certificate

active

07343698

ABSTRACT:
A reduced pressure drying apparatus comprises a substrate stage section for disposing thereon a substrate having the surface coated with a coating liquid containing a film-forming component and a solvent, a hermetic vessel having the substrate stage section arranged therein, an exhaust means for reducing the pressure inside the hermetic vessel, a gaseous stream distribution control plate arranged apart from and in a manner to face the surface of the substrate disposed on the substrate stage section and provided with a plurality of gaseous stream-flowing ports through which flow a gaseous stream, each of the plurality of gaseous stream-flowing ports having a gaseous stream-flowing region, and a control means for controlling the distribution pattern of the gaseous stream-flowing regions of the gaseous stream distribution control plate.

REFERENCES:
patent: 6190459 (2001-02-01), Takeshita et al.
patent: 6579373 (2003-06-01), Moriyama
patent: 6872259 (2005-03-01), Strang
patent: 2002-313709 (2002-10-01), None

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