Reduced pitch multiple exposure process

Details Reduced pitch multiple exposure process Reduced pitch multiple exposure process

2011-03-15

2011-03-15

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000

Reexamination Certificate

active

07906270

ABSTRACT:
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.

REFERENCES:
patent: 5902716 (1999-05-01), Owa et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 2003/0008245 (2003-01-01), Iwasaki et al.
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2004/0005507 (2004-01-01), Lakkapragada et al.
patent: 2005/0175937 (2005-08-01), Bae
patent: 61-174718 (1986-08-01), None
patent: 02-262319 (1990-10-01), None
patent: 04-071222 (1992-03-01), None
patent: 08-250395 (1996-09-01), None
patent: 11-072925 (1999-03-01), None
patent: 2002-367877 (2002-12-01), None
Notice of Reasons for Rejection for Japanese Patent Application No. 2006-114997 dated Jun. 1, 2009.

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