Reduced light scattering in projected images formed from...

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product

Reexamination Certificate

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C430S117200

Reexamination Certificate

active

10750458

ABSTRACT:
A method of manufacturing transparencies reduces light scattering in a projection transparency formed with an electrostatically deposited color image. The method comprises:providing a transparent support substrate;forming an electrostatically deposited color developer image on the support substrate, the color developer image containing at least 25% by weight of organic liquid carrier, the color developer having dispersed particles comprising thermoplastic polymer therein, said dispersed particles having an effective Tg; andheating the color developer image on the support at a temperature and for a time that the thermoplastic polymer coalesces and at least some of the organic liquid carrier evaporates at a rate that free volume between the particles is reduced and light scattering is thereby reduced.

REFERENCES:
patent: 4298309 (1981-11-01), Stoltz
patent: 4420244 (1983-12-01), Landa
patent: 4794651 (1988-12-01), Landa et al.
patent: 5115277 (1992-05-01), Camis
patent: 5176974 (1993-01-01), Till et al.
patent: 5208093 (1993-05-01), Carls et al.
patent: 5229203 (1993-07-01), Sato
patent: 5270776 (1993-12-01), Landa
patent: 5410392 (1995-04-01), Landa
patent: 5451458 (1995-09-01), Malhotra
patent: 5517479 (1996-05-01), Nakanishi et al.
patent: 5559592 (1996-09-01), Larson et al.
patent: 5635325 (1997-06-01), Inaba et al.
patent: 5824442 (1998-10-01), Tanikawa et al.
patent: 5908729 (1999-06-01), Landa et al.
patent: 5916718 (1999-06-01), Kellie et al.
patent: 6255363 (2001-07-01), Baker et al.
patent: 6296391 (2001-10-01), Hayakawa et al.
patent: 6391954 (2002-05-01), Azizi et al.

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