Reduced contaminant gas injection system and method of using

Details Reduced contaminant gas injection system and method of using Reduced contaminant gas injection system and method of using

2006-03-30

2010-06-29

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345330, C156S345340, C156S345430, C156S345450

Reexamination Certificate

active

07743731

ABSTRACT:
A gas injection system includes a diffuser to distribute a process gas in a processing chamber. The gas injection system may be utilized in a polysilicon etching system involving corrosive process gases.

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patent: 2006/0060138 (2006-03-01), Keller et al.
patent: 2006/0213439 (2006-09-01), Ishizaka
International Search Report issued in International Application No. PCT/US07/61041, dated Sep. 26, 2007.
International Preliminary Report on Patentability issued in Application No. PCT/US07/061041, mailed. Oct. 9, 2008.

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