Real time monitoring of particulate contamination in a wafer...

Details Real time monitoring of particulate contamination in a wafer... Real time monitoring of particulate contamination in a wafer...

2007-07-24

2007-07-24

Wachsman, Hal (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Mechanical measurement system

C702S057000, C702S183000, C702S184000, C702S185000, C702S186000, C702S187000, C702S188000, C702S189000, C702S190000, C702S191000, C702S193000, C702S193000, C702S197000

Reexamination Certificate

active

11230386

ABSTRACT:
An apparatus and method for use is described which permits real time monitoring of build-up of particulate contamination in a wafer processing chamber. The apparatus is capable of monitoring particle build up in regions of a processing chamber which are not accessible by traditional optical particle scanners. An accelerometer is fastened to a body in the chamber upon which particulates deposit. The body is subjected to vibrations and produces a vibration signal which is detected by the accelerometer. The signal is processed to form a frequency spectrum of vibration amplitudes. Frequencies in a selected band are directly proportional to the particulate build up on the body. The invention is applied to a wafer annealing tool with a rotatable platform wherein particles deposit on a support body under the wafer. The method and apparatus have been shown to be reliable and accurate as well as cost effective and easily implemented.

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