Real-time monitoring apparatus for plasma process

Details Real-time monitoring apparatus for plasma process Real-time monitoring apparatus for plasma process

2007-02-27

2007-02-27

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

With plural diverse test or art

C356S630000, C156S345240, C204S298320

Reexamination Certificate

active

11060501

ABSTRACT:
A real-time monitoring apparatus for a plasma process comprises a plurality of measuring units (10) mounted on a semiconductor wafer, a receiving device (7) for receiving a signal transmitted from each of the measuring units (10), and a data processing apparatus (6) for detecting a condition of the semiconductor wafer (3) based on the received signal. In this apparatus, each of the measuring units (10) includes at least one plasma process detection sensor (11), a light-emitting device (16) for converting an output of the plasma process detection sensor into an optical output, and a power supply (17) for supplying drive power to the light-emitting device (16).

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