Reactor surface passivation through chemical deactivation

Details Reactor surface passivation through chemical deactivation Reactor surface passivation through chemical deactivation

2006-10-10

2006-10-10

Meeks, Timothy (Department: 1762)

Coating processes

Interior of hollow article coating

C427S237000, C427S248100, C427S255230, C427S255260, C427S255270

Reexamination Certificate

active

07118779

ABSTRACT:
Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated, in situ or ex situ, with chemicals that deactivate reactive sites on the reaction space surface(s). A pre-treatment step can maximize the available reactive sites prior to the treatment step. With reactive sites deactivated by adsorbed treatment reactant, during subsequent processing the reactant gases have reduced reactivity or deposition upon these treated surfaces. Accordingly, purge steps can be greatly shortened and a greater number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls.

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