Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1987-08-20
1989-02-07
Thibodeau, Paul J.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427131, 427132, 428336, 428694, 428695, 428900, G11B 564
Patent
active
048031305
ABSTRACT:
A method of mixing ferromagnetic recording media comprising the steps of:
REFERENCES:
patent: 3531322 (1970-09-01), Kefalas et al.
patent: 4069360 (1978-01-01), Yanagisawa et al.
patent: 4124736 (1978-11-01), Patel et al.
patent: 4210946 (1980-07-01), Iwasaki et al.
patent: 4239835 (1980-12-01), Iijima et al.
patent: 4267238 (1981-05-01), Chernega
patent: 4268556 (1981-05-01), Pedrotty
patent: 4327139 (1982-04-01), Schaefer et al.
patent: 4333985 (1982-06-01), Shirahata et al.
patent: 4404247 (1983-09-01), Dominquez-Burquette et al.
patent: 4419404 (1983-12-01), Arai et al.
patent: 4495242 (1985-01-01), Arai et al.
patent: 4521482 (1985-06-01), Arai et al.
patent: 4526833 (1985-07-01), Burquette et al.
patent: 4536444 (1985-08-01), Sumiya et al.
patent: 4554217 (1985-11-01), Grimm et al.
patent: 4565734 (1986-01-01), Arai et al.
patent: 4581245 (1986-04-01), Nakamura et al.
patent: 4596735 (1986-06-01), Noguchi et al.
Moe Carmen D.
Skorjanec Joseph
Little Douglas B.
Minnesota Mining and Manufacturing Company
Sell Donald M.
Thibodeau Paul J.
LandOfFree
Reactive sputtering process for recording media does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reactive sputtering process for recording media, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactive sputtering process for recording media will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1084318