Reactive sputter deposition of lead chevrel phase thin films

Details Reactive sputter deposition of lead chevrel phase thin films Reactive sputter deposition of lead chevrel phase thin films

1992-09-08

1995-06-06

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419224, C23C 1434

Patent

active

054219736

ABSTRACT:
A method is provided to form a lead Chevrel phase coating of the formula PbMo.sub.6 S.sub.8 on a substrate by employing the techniques of reactive sputtering comprising: (a) sputtering lead (Pb) and molybdenum (Mo) from homogeneous targets of Pb and Mo in vacuo in an atmosphere of argon and hydrogen sulfide so as to deposit a coating of PbMo.sub.6 S.sub.8 on said substrate; and (b) annealing said PbMo.sub.6 S.sub.8 coating at a pressure at which Pb is not lost from the coating; wherein the targets and the substrate are contained within a vacuum chamber during steps (a) and (b).

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