Reactive ion etching process

Details Reactive ion etching process Reactive ion etching process

1985-06-20

1986-07-22

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156663, 204192E, 252 791, B44C 122, C03C 1500, C03C 2506

Patent

active

046017828

ABSTRACT:
In a process for etching by reactive ion etching, a ceramic partially masked by an organic photoresist, an etch gas containing SF.sub.6, a noble gas and a small percentage of a carbon-containing gas is used.

REFERENCES:
patent: 4330384 (1982-05-01), Okudaira et al.
patent: 4447290 (1984-05-01), Matthews

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