Reactive ion etching of lead zirconate titanate and ruthenium ox

Details Reactive ion etching of lead zirconate titanate and ruthenium ox Reactive ion etching of lead zirconate titanate and ruthenium ox

1993-06-10

1996-03-05

Chaudhuri, Olik

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

216 6, 216 76, H01L 213065

Patent

active

054964377

ABSTRACT:
A method of reactive ion etching both a lead zirconate titanate ferroelectric dielectric and a RuO.sub.2 electrode, and a semiconductor device produced in accordance with such process. The dielectric and electrode are etched in an etching gas of O.sub.2 mixed with either CClF.sub.2 or CHClFCF.sub.3.

REFERENCES:
patent: 4963701 (1990-10-01), Yasumoto et al.
patent: 5109357 (1992-04-01), Eaton, Jr.
patent: 5185689 (1993-02-01), Maniar
patent: 5254217 (1993-10-01), Maniar et al.

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