Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-05-09
1986-01-28
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156656, 156657, 1566591, 156662, 156345, 204192E, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102
Patent
active
045669414
ABSTRACT:
A reactive ion etching method utilizing high frequency voltage wherein cathode drop voltage developed in the vicinity of an electrode disposed for impressing a high frequency power is gradually reduced immediately before stopping the impression of high frequency power at the end of ion etching process, thereby reducing the voltage impressed on an insulation layer within a semiconductor wafer below the breakdown voltage of the insulation layer.
REFERENCES:
patent: 4207137 (1980-01-01), Tretola
patent: 4349409 (1982-09-01), Shibayama et al.
Watanabe Tohru
Yoshida Yukimasa
Kabushiki Kaisha Toshiba
Powell William A.
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