Reaction resin mixtures and use thereof

Details Reaction resin mixtures and use thereof Reaction resin mixtures and use thereof

1998-06-26

2000-10-03

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 31, 522 25, 522 15, 430269, 4302881, 4302701, 430325, 264401, 528 90, 528409, 525 12, 525 23, 525 24, 526198, 526204, 526209, 526222, G03F 7029, G03F 726, G03F 730

Patent

active

06127092&

ABSTRACT:
Curable reaction resin mixtures which are suitable for stereolithography have the following composition:

REFERENCES:
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patent: 4102687 (1978-07-01), Crivello
patent: 4417061 (1983-11-01), Crivello et al.
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4677137 (1987-06-01), Bany et al.
patent: 5073476 (1991-12-01), Meier et al.
patent: 5144051 (1992-09-01), Kessel et al.
patent: 5437964 (1995-08-01), Lapin et al.
patent: 5476748 (1995-12-01), Steinmann et al.
patent: 5510226 (1996-04-01), Lapin et al.
"Photopolymere," VEB Deutscher Verlag fur Grundstoffindustrie, Leipzig 1988, p. 105.
Crivello, J.V. et al., "Structural and Mechanistic Studies on the Photolysis of Dialkylphenacylsulfonium Salt Cationic Photoinitiators," Macromolecules, vol. 16 (1983), pp. 864-870.
Kikkawa, A. et al., "Cationic Polymerization of Vinyl Monomers With Latent Initiators," Makromolekulare Chemie, vol. 192 (1991), pp. 655-662.

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