Reaction product, preparation thereof and radiation-sensitive ma

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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522 97, 526301, 526263, 528 68, 528 75, 528 73, G03F 7031, G03F 7027, G03F 7038, C08G 800

Patent

active

051769859

ABSTRACT:
A reaction product useful for preparing radiation-sensitive materials, in particular materials whose solubility in water or aqueous alkali increases on irradiation, contains urea and urethane groups and also carboxyl groups and is obtained by reaction of

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3991033 (1976-11-01), Sam
patent: 4009040 (1977-02-01), Nebe
patent: 4029505 (1977-06-01), Nebe
patent: 4086210 (1978-04-01), Petropoulos
patent: 4162274 (1979-07-01), Pilz
patent: 4189611 (1980-02-01), Sam
patent: 4198242 (1980-04-01), Pazos
patent: 4228232 (1980-10-01), Rousseau et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4269933 (1981-05-01), Pazos
patent: 4304923 (1981-12-01), Rousseau et al.
patent: 4358354 (1982-11-01), Iida et al.
patent: 4366230 (1982-12-01), Ahne et al.
patent: 4368253 (1983-01-01), Green et al.
patent: 4371685 (1983-02-01), Ahne et al.
patent: 4415652 (1988-11-01), Proskow
patent: 4469774 (1984-09-01), Lee
patent: 4481281 (1984-11-01), Tsao et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4506006 (1985-03-01), Ruckert
patent: 4603101 (1986-07-01), Crivello
patent: 4673705 (1987-06-01), Ansel et al.
patent: 4690501 (1987-09-01), Zimmerman et al.
patent: 4690502 (1987-09-01), Zimmerman et al.
patent: 4712740 (1988-01-01), Hung et al.
patent: 4786577 (1988-11-01), Aoai et al.

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