Reaction chamber component having improved temperature uniformit

Details Reaction chamber component having improved temperature uniformit Reaction chamber component having improved temperature uniformit

1999-06-30

2000-09-26

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 118715, 156345, 204473, 20429809, 20429808, C23C 1600, C23F 102

Patent

active

061237752

ABSTRACT:
A component useful for a plasma reaction chamber includes a heat sink such as a temperature-controlled support member and a heated member such as an electrically powered showerhead electrode. The showerhead electrode is peripherally secured to the support member to enclose a gas distribution chamber between a top surface of the electrode and a bottom surface of the support member. A heat transfer member extends between the electrode and the support member and transfers heat from an area of temperature buildup on the top surface of the showerhead electrode to the bottom surface of the support member in order to control the temperature distribution across the showerhead electrode.

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