Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate
2006-09-05
2006-09-05
Fletcher, Marlon T. (Department: 2837)
Coating apparatus
Gas or vapor deposition
Chamber seal
C118S050000, C220S315000, C220S810000, C016S235000, C016S239000
Reexamination Certificate
active
07101442
ABSTRACT:
A reaction apparatus including: a main body having a reaction chamber with an upper opening thereof, a lid hinge, and a lid combined to the lid hinge, rotationally opening and closing the upper opening; a lifting member having a first end part separated from a rotation axis of the lid and rotatably combined with the lid, and a second end part rotatably combined to the main body, that moves in opening and closing directions; and a driver activating the lifting member. With this configuration, the present invention provides a reaction apparatus, with a lid that is opened and closed readily, and in which the lid parallelly contacts a sealing member, and thereby creating a vacuum in the reaction chamber with ease.
REFERENCES:
patent: 3195873 (1965-07-01), Philbrick, Jr.
patent: 3269587 (1966-08-01), Svenson
patent: 4169538 (1979-10-01), Bird et al.
patent: 4788999 (1988-12-01), Dalpane
patent: 4853985 (1989-08-01), Perry
patent: 5205532 (1993-04-01), Naehring
patent: 5400442 (1995-03-01), Pendlebury
patent: 5731678 (1998-03-01), Zila et al.
patent: 5794277 (1998-08-01), Jones
patent: 6050446 (2000-04-01), Lei et al.
patent: 6067667 (2000-05-01), Suzuki
patent: 6237985 (2001-05-01), O'Brian
patent: 6336395 (2002-01-01), Tiszai
patent: 6406209 (2002-06-01), Liu et al.
patent: 6517634 (2003-02-01), Pang et al.
patent: 6776848 (2004-08-01), Rosenstein et al.
patent: 2003/0010451 (2003-01-01), Tzu et al.
patent: 11-101345 (1999-04-01), None
patent: 11-159696 (1999-06-01), None
Copy of Korean Office Action.
Choi Jin-hyuk
Kam Do-young
Kim Jung-wook
Lee Suk-chan
Colon Santana Eduardo
Fletcher Marlon T.
Staas & Halsey , LLP
LandOfFree
Reaction apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reaction apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reaction apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3570320