Rapidly solidified nickel aluminide of improved stoichiometry an

Details Rapidly solidified nickel aluminide of improved stoichiometry an Rapidly solidified nickel aluminide of improved stoichiometry an

1984-09-04

1987-02-10

Dean, Richard O.

Metal treatment

Compositions

Heat treating

148429, C22F 110

Patent

active

046421394

ABSTRACT:
It has been found that tri-nickel aluminide compositions are quite sensitive to the ratio of nickel to aluminum in their ability to receive boron as a dopant and that compositions which are relatively poor in the aluminum component can be doped more effectively with boron. Further, it has been found for the nickel aluminides which have lower concentrations of aluminum that the percentage of boron which can be added to the composition to effectively increase the strength of the alloys is favored by the lower aluminum ratio so that higher concentrations of boron are addable. The compositions which result have significant strength properties based on tensile tests of the compositions.

REFERENCES:
C. T. Liu, C. L. White, C. C. Koch, & E. H. Lee, "Preparation of Ductile Nickel Aluminides for High Temperature Use", Proc. Electrochemical Soc. on High Temp. Mat., Ed. M. Cubicciotti, vol. 83-7, Electrochemical Society Inc. (1983), p. 32.
C. T. Liu & C. C. Koch, "Development of Ductile Polycrystalline Ni.sub.3 Al for High-Temperature Applications", Technical Aspects of Critical Materials Use by the Steel Industry, NBSIR 83-2679-2, vol. II B, Jun. 1983, Center for Materials Science, U.S. Dept. of Commerce, National Bureau of Standards.

Affiliated with

Also associated with

Rating

Rapidly solidified nickel aluminide of improved stoichiometry an does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapidly solidified nickel aluminide of improved stoichiometry an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapidly solidified nickel aluminide of improved stoichiometry an will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2362006