Rapid thermal processing (RTP) system with rotating substrate

Details Rapid thermal processing (RTP) system with rotating substrate Rapid thermal processing (RTP) system with rotating substrate

1997-10-24

1999-10-12

Pelham, Joseph

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

118730, 392418, C23C 1600

Patent

active

059650478

ABSTRACT:
A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.

REFERENCES:
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5421893 (1995-06-01), Perlov
patent: 5551982 (1996-09-01), Anderson et al.
patent: 5551985 (1996-09-01), Brors et al.
patent: 5584936 (1996-12-01), Pickering et al.
patent: 5715361 (1998-02-01), Moslehi

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