Electric lamp and discharge devices: systems – Pulsating or a.c. supply – Plural load device systems
Patent
1975-02-26
1977-11-08
Engle, Samuel W.
Electric lamp and discharge devices: systems
Pulsating or a.c. supply
Plural load device systems
3151117, H01J 3700, G21B 100
Patent
active
040574628
ABSTRACT:
Electromagnetic (E.M.) energy injection method and apparatus for producing and sustaining suprathermal ordered ions in a neutral, two-ion-species, toroidal, bulk equilibrium plasma. More particularly, the ions are produced and sustained in an ordered suprathermal state of existence above the average energy and velocity of the bulk equilibrium plasma by resonant rf energy injection in resonance with the natural frequency of one of the ion species. In one embodiment, the electromagnetic energy is injected to clamp the energy and velocity of one of the ion species so that the ion energy is increased, sustained, prolonged and continued in a suprathermal ordered state of existence containing appreciable stored energy that counteracts the slowing down effects of the bulk equilibrium plasma drag. Thus, selective deuteron absorption may be used for ion-tail creation by radio-frequency excitation alone. Also, the rf can be used to increase the fusion output of a two-component neutral injected plasma by selective heating of the injected deuterons.
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Hooke William M.
Jassby Daniel L.
Belkin Leonard
Cangialos S. A.
Carlson Dean E.
Cornish C. Daniel
Engle Samuel W.
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