Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2009-02-05
2011-10-18
Chang, Daniel D (Department: 2819)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111410
Reexamination Certificate
active
08040068
ABSTRACT:
A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.
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Coumou David J.
Eyerman Paul
Fisk, II Larry J.
Ioriatti Carl
Pham Richard
Chang Daniel D
Harness & Dickey & Pierce P.L.C.
MKS Instruments Inc.
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