Radio-frequency plasma source

Details Radio-frequency plasma source Radio-frequency plasma source

1995-10-17

1997-01-07

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31511131, 31511181, 31323131, 313234, H01J 724

Patent

active

055920551

ABSTRACT:
A plasma source is described, comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of electrodes (13, 15) which are associated with said discharge chamber (1) and which are connected to a radio-frequency generator (17), and which apply an oscillating electric field within the discharge chamber, and means (9, 11) for generating a static magnetic field in said discharge chamber. Coaxially with said discharge chamber (1) there are disposed a first and a second electrode (15; 13; 13X), at least one of which has an annular extent and is disposed in an intermediate position along the axial extent of the discharge chamber, said two electrodes (15; 13; 13X) being connected to two poles of the radio-frequency generator.

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patent: 5077499 (1991-12-01), Oku
patent: 5081398 (1992-01-01), Asmussen et al.
patent: 5107170 (1992-04-01), Ishikawa et al.
patent: 5241243 (1993-08-01), Cirri
patent: 5241244 (1993-08-01), Cirri

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