Radio frequency monitor for semiconductor process control

Details Radio frequency monitor for semiconductor process control Radio frequency monitor for semiconductor process control

1995-03-27

1995-12-05

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 1566431, 216 61, 216 67, H01L 21306, B44C 122

Patent

active

054725615

ABSTRACT:
A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or used to provide feedback for in-situ control of an ongoing plasma process.

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"Beyond RF-Power Measurements", Paul Miller et al., NCSL meeting, Santa Clara, 11 Feb. 1993, pp. 1-16.

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