Radical polymerizable composition and lithographic printing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S285100, C430S325000, C430S271100, C430S302000, C430S916000, C430S921000, C430S925000, C430S944000

Reexamination Certificate

active

10900169

ABSTRACT:
A radical polymerizable composition comprising (A) an alkali-soluble resin containing a radical polymerizable group, (B) a radical polymerizable compound, and (C) a radical initiator, wherein reactivity of a polymerizable group of the polymerizable compound 4B) to a polymerizable group of the polymerizable compound (B) is larger than reactivity of a polymerizable group of the polymerizable compound (B) to a radical polymerizable group of the alkali-soluble resin (A), and a reactivity of a radical polymerizable group of the alkali-soluble resin (A) to a polymerizable group of the polymerizable compound (B) is larger than reactivity of a radical polymerizable group of the alkali-soluble resin (A) to a radical polymerizable group of the alkali-soluble resin (A).

REFERENCES:
patent: 2850445 (1958-09-01), Oster
patent: 4708925 (1987-11-01), Newman
patent: 2003/0008239 (2003-01-01), Fujimaki et al.
patent: 2004/0009426 (2004-01-01), Goto et al.
patent: 1 341 040 (2003-09-01), None
patent: 44-20189 (1969-08-01), None
patent: 8-276558 (1996-10-01), None
patent: 2000-187322 (2000-07-01), None

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