Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2006-09-27
2009-06-02
Porta, David P (Department: 2884)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C101S450100, C378S034000
Reexamination Certificate
active
07541603
ABSTRACT:
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
REFERENCES:
patent: 4692884 (1987-09-01), Pryor
patent: 2002/0037461 (2002-03-01), van der Werf et al.
patent: 2003/0146398 (2003-08-01), Schriever
patent: 2004/0165160 (2004-08-01), van Beek et al.
patent: 2005/0254122 (2005-11-01), Fricke
patent: 2006/0066824 (2006-03-01), Knappe et al.
patent: 1065568 (2001-01-01), None
patent: 1 202 117 (2002-05-01), None
patent: 1 331 519 (2003-07-01), None
patent: 1 471 385 (2004-10-01), None
patent: 1 526 550 (2005-04-01), None
patent: 1 530 091 (2005-05-01), None
patent: 1 643 310 (2006-04-01), None
patent: WO 2007/064210 (2007-06-01), None
Search Report and Written Opinion for International Application No. PCT/NL2007/050466 mailed Jun. 19, 2008, 10 pgs.
Banine Vadim Yevgenyevich
Driessen Niels Machiel
Franken Johannes Christiaan Leonardus
Frijns Olav Waldemar Vladimir
Klunder Derk Jan Wilfred
ASML Netherlands B.V.
Gaworecki Mark R
Porta David P
Sterne Kessler Goldstein & Fox P.L.L.C.
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