Radiation system and lithographic apparatus comprising the same

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

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C378S034000

Reexamination Certificate

active

07863591

ABSTRACT:
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

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