Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2007-06-19
2007-06-19
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100
Reexamination Certificate
active
11133460
ABSTRACT:
A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.
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Banine Vadim Yevgenyevich
Klunder Derk Jan Wildred
Van Herpen Maarten Marinus Johannes Wilhelmus
Wassink Arnoud Cornelis
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Smith II Johnnie L
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