Radiation sensitive terpolymer, photoresist compositions thereof

Details Radiation sensitive terpolymer, photoresist compositions thereof Radiation sensitive terpolymer, photoresist compositions thereof

1999-02-22

2000-11-14

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

4302701, 430323, 430326, 430910, G03F 7004, G03F 736

Patent

active

061467936

ABSTRACT:
A terpolymer with chemically amplified (acid labile) moieties and organosilicon moieties suitable for use as the binder resin for a photoimageable resist photoresist composition suitable for use in 193 nm photolithographic processes.
The terpolymers have the following structural units: ##STR1## where R is a methyl or hydroxyethyl group, R.sup.1 is a hydrogen atom, a methyl group or a --CH.sub.2 COOCH.sub.3 group and R.sup.2 and R.sup.3 are each independently a hydrogen atom or a methyl group.

REFERENCES:
patent: 4839109 (1989-06-01), Kaetsu et al.
patent: 5395734 (1995-03-01), Vogel et al.
patent: 5856071 (1999-01-01), Kotachi et al.

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