Radiation sensitive resin composition containing quinone diazide

Details Radiation sensitive resin composition containing quinone diazide Radiation sensitive resin composition containing quinone diazide

1996-03-22

1997-09-30

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03F 7023

Patent

active

056724594

ABSTRACT:
The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.

REFERENCES:
patent: 5278021 (1994-01-01), Jeffries, III
patent: 5290658 (1994-03-01), Uenishi et al.
patent: 5306596 (1994-04-01), Oie et al.
patent: 5478692 (1995-12-01), Doi et al.
patent: 5532107 (1996-07-01), Oie et al.
Derwent WPI, Database Publications, AN-92-317641/39, JP-4-284454, Oct. 9, 1992.
Derwent WPI, Database Publications, AN-394165/48, JP-4-293050, Oct. 16, 1992.
Derwent WPI, Database Publications, AN-93-354204/45, JP-5-257274, Oct. 8, 1993.

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