Radiation-sensitive resin composition

Details Radiation-sensitive resin composition Radiation-sensitive resin composition

2007-04-10

2007-04-10

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S921000

Reexamination Certificate

active

11116269

ABSTRACT:
A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),wherein R1is a hydrogen or methyl, R2is a C4-10tertiary alkyl, R3and R4are a hydrogen, C1-12alkyl, C6-15aromatic, C1-12alkoxyl, or R3and R4may form, in combination and together with the nitrogen atom with which the R3and R4groups bond, a C3-15cyclic structure, provided that R3and R4are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

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Yasunori Uetani et al., SPIE vol. 3678, 0277-786X/99, “Positive ArF resist with 2EAdMA/GbLMA resin system,” pp. 510-517.

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