Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-23
2005-08-23
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S283100, C430S286100, C430S905000, C430S325000
Reexamination Certificate
active
06933094
ABSTRACT:
A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),wherein R1is a hydrogen or methyl, R2is a C4-10tertiary alkyl, R3and R4are a hydrogen, C1-12alkyl, C6-15aromatic, C1-12alkoxyl, or R3and R4may form, in combination and together with the nitrogen atom with which the R3and R4groups bond, a C3-15cyclic structure, provided that R3and R4are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
REFERENCES:
patent: 5215857 (1993-06-01), Hosaka et al.
patent: 5238774 (1993-08-01), Hosaka et al.
patent: 5405720 (1995-04-01), Hosaka et al.
patent: 5494784 (1996-02-01), Hosaka et al.
patent: 5893701 (1999-04-01), Pruett
patent: 5925492 (1999-07-01), Hosaka et al.
patent: 6013416 (2000-01-01), Nozaki et al.
patent: 6020104 (2000-02-01), Hosaka et al.
patent: RE37179 (2001-05-01), Yamachika et al.
patent: 6228554 (2001-05-01), Hosaka et al.
patent: 6270939 (2001-08-01), Hosaka et al.
patent: 6280900 (2001-08-01), Chiba et al.
patent: 6337171 (2002-01-01), Kobayashi et al.
patent: 0440374 (1991-08-01), None
patent: 0 574 939 (1993-12-01), None
patent: 0788031 (1997-08-01), None
patent: 1033624 (2000-09-01), None
patent: 1 091 248 (2001-04-01), None
patent: 2-161436 (1990-06-01), None
patent: 4-211258 (1992-08-01), None
patent: 5-249682 (1993-09-01), None
patent: 7-140666 (1995-06-01), None
Yasunori Uetani et al., SPIE vol. 3678—0277-786X/99, “Positive ArF resist with 2EAdMA/GbLMA resin system,” pp:510-517.
Ishii Hiroyuki
Kajita Toru
Miyaji Masaaki
Nagai Tomoki
Nishimura Yukio
DLA Piper Rudnick Gray Cary US LLP
JSR Corporation
Kelber Steven B.
Thornton Yvette C.
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