Radiation-sensitive resin composition

Details Radiation-sensitive resin composition Radiation-sensitive resin composition

2005-05-31

2005-05-31

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S913000, C430S914000, C430S917000, C430S921000

Reexamination Certificate

active

06899989

ABSTRACT:
A radiation-sensitive resin composition comprising (A) a photoacid generator such as2,4,6-trimethylphenyldiphenylsulfonium2,4-difluorobenzenesulfonate or2,4,6-trimethylphenyldiphenylsulfonium4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.

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