Radiation sensitive resin composition

Details Radiation sensitive resin composition Radiation sensitive resin composition

1998-05-21

1999-09-28

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302851, 4302861, 430914, 430921, 430920, 430927, G03C 1492

Patent

active

059586486

ABSTRACT:
A radiation sensitive resin composition comprising (A) a fluorine-containing copolymer of hexafluoropropylene, at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and an unsaturated compound (B) an acid generating compound which generates an acid upon exposure to radiation; (C) a cross-linkable compound; and (D) an organic solvent. The composition suitable is useful for a negative resist for forming a mask for the production of a circuit such as a semiconductor integrated circuit or a thin film transistor circuit for liquid crystal displays as well as a material for forming a permanent film such as an interlaminar insulating film or a color filter protective film.

REFERENCES:
patent: 4963471 (1990-10-01), Trout et al.
patent: 5362597 (1994-11-01), Sano et al.
patent: 5364910 (1994-11-01), Takinishi et al.
patent: 5399604 (1995-03-01), Sano et al.
patent: 5432039 (1995-07-01), Shimokawa et al.

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