Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-04-19
1997-03-11
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
G03C 1492
Patent
active
056099886
ABSTRACT:
A radiation sensitive resin composition useful as a negative type resist which can form a resist pattern having a good shape, has so high acid resistance as not to be affected by an etchant and a high adhesion to the substrate, and is endowed with so high a strippability as to be easily dissolved in a stripping solution consisting of an organoalkali. Said composition comprises (1) 100 parts by weight of an alkali-soluble novolak resin having a polystyrene reduced weight average molecular weight of 1,000 to 10,000, (2) 1 to 10 parts by weight of a compound having a methylol group and/or an alkoxymethyl group and being capable of cross-linking the alkali-soluble novolak resin (1) in the presence of an acid, and (3) 0.01 to 5 parts by weight of a radiation sensitive acid-generating agent represented by formula (I): ##STR1##
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Miura Takao
Miyamoto Hidetoshi
Shiraki Shinji
Yumoto Yoshiji
Chapman Mark
Japan Synthetic Rubber Co. Ltd.
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