Radiation sensitive resin composition

Details Radiation sensitive resin composition Radiation sensitive resin composition

1998-08-18

2000-10-24

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430921, G03F 7038, G03F 7039

Patent

active

061365009

ABSTRACT:
Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.

REFERENCES:
patent: 5376496 (1994-12-01), Elsaesser et al.
patent: 5648195 (1997-07-01), Sebalid et al.
patent: 5663035 (1997-09-01), Masuda et al.

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