Radiation sensitive resin composition

Details Radiation sensitive resin composition Radiation sensitive resin composition

1997-07-14

1999-09-14

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430326, 430921, 430927, G03C 1492

Patent

active

059521503

ABSTRACT:
A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution capability, and is capable of producing excellent resist patterns. The positive-tone type composition comprises (A) a disulfonylmethane derivative in which the main chain with two sulfonyl groups bonded forms a three to eleven member cyclic carbon structure and (B) (a) a resin protected by an acid decomposable group or (b) an alkali-soluble resin and an alkali-solubility control agent. The negative-tone type composition comprises the component (A), (C) an alkali-soluble resin, and (D) a cross-linking agent.

REFERENCES:
patent: 5332650 (1994-07-01), Murata et al.
patent: 5348838 (1994-09-01), Ushirogouchi et al.
patent: 5372914 (1994-12-01), Naito et al.
patent: 5525453 (1996-06-01), Przybilla et al.
Yu, J. et al., Tetrahedron Lett., 35(30), pp. 5437-5440, 1994.

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