Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1978-12-26
1981-01-06
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415914, 20415922, 430296, 526292, G03C 168
Patent
active
042437423
ABSTRACT:
Radiation-sensitive positively acting materials for ultraviolet, electron beam or X-ray lithography based on linear non-crosslinked copolymers of acrylic acid or methacrylic acid or derivatives of these acids, which copolymers have side chains of different length. Copolymers are provided comprising three or more monomers and corresponding to the general form of copolymer ABC, in which monomer A represents a compound or several compounds of the formula: ##STR1## monomer B represents a compound of the formula: ##STR2## and monomer C represents a compound of the formula: ##STR3## in which R.sub.1, R.sub.2, R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are hydrogen atoms, acrylic or alkyl groups and R.sub.3 are ester or ketone groups.
REFERENCES:
patent: 3981985 (1976-09-01), Roberts
patent: 4035321 (1977-07-01), Shahidi et al.
patent: 4061832 (1977-12-01), Roberts
patent: 4157261 (1979-06-01), Takeda
Chemical Abstracts, vol. 86 (1977) Abstract No, 197885, Roberts.
Haller et al., IBM Journal (5/1968) "High-Resolution Positive Resist for Electron Exposure".
Hersener Jurgen
Wilhelm Alfred
Brammer Jack P.
LICENTIA Patent-Verwaltungs-G.m.b.H.
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