Radiation-sensitive positive resist comprising a fluorine-contai

Details Radiation-sensitive positive resist comprising a fluorine-contai Radiation-sensitive positive resist comprising a fluorine-contai

1987-03-20

1989-01-24

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430966, 430942, 526245, G03C 524, G03C 1495

Patent

active

048001511

ABSTRACT:
The present invention relates to a radiation-sensitive positive resist comprising a copolymer obtained by copolymerizing 2,2,2-trifluoroethyl .alpha.-chloroacrylate with 2,2,3,3-tetrafluoropropyl .alpha.-chloroacrylate at a weight ratio of between 90:10 and 50:50 and a radiation-sensitive positive resist composition essentially comprising said copolymer and a solvent containing methyl cellosolve acetate as a major component. The resist and the resist composition according to the present invention exhibit high sensitivity and excellent reproducibility, so that they are useful in the production of a photo mask which is used in the production of LSI, VLSI and the like.

REFERENCES:
patent: 3425867 (1969-02-01), Stillo
patent: 4259407 (1981-03-01), Tada et al.
patent: 4268590 (1981-05-01), Eranian et al.
patent: 4454222 (1984-06-01), Tada et al.
patent: 4518675 (1985-05-01), Kataoka
patent: 4539250 (1985-09-01), Fujii et al.
Tsukasa; Tada, "Poly(Trifluorethyl .alpha.-Chloroacrylate) as a Highly Sensitive Positive Electron Resist", Journal of Electrochemical Society: Accelerated Brief Communication, vol. 126, Nov. 1979, pp. 1829-1830.

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