Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-02-10
1986-08-26
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430196, 430197, 430919, 430906, 525426, 522 63, 522 65, 522 28, G03C 170, C08F 800, C08F 246
Patent
active
046083332
ABSTRACT:
A radiation-sensitive composition is described, which is comprised of (1) a polymer containing repeating units of the formula: ##STR1## wherein R.sup.1 is a trivalent or tetravalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.2 is a divalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.3 is hydrogen or an ammonium ion, n is 1 or 2, and COOR.sup.3 is located in an ortho or peri position with respect to the amide linkage, (2) an organic compound having a radiation-dimerizable or radiation-polymerizable olefinic double bond and an amino radical or a quaternary ammonium salt, and (3) an aromatic secondary or tertiary amine compound which is chemically inactive to actinic radiation. This composition has an improved photo-sensitivity or radiation sensitivity and can give highly heat-resistant relief patterns with a good edge sharpness and good mechanical and chemical properties as well as good insulating properties. Heat-resistant relief patterns obtained from this composition are especially useful as insulating, passivating or protective coatings in semiconductor devices.
REFERENCES:
patent: 3623870 (1971-11-01), Curran et al.
patent: 3661588 (1972-05-01), Chang
patent: 3759807 (1973-09-01), Osborn et al.
patent: 3926640 (1975-12-01), Rosen
patent: 3957512 (1976-05-01), Kleeburg et al.
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4383903 (1983-05-01), Ayano et al.
patent: 4451551 (1984-05-01), Kataoka et al.
C. G. Roffey, Photopolymerization of Surface Coatings, (John Wiley & Sons Ltd., 1982, New York, N.Y.), pp. 72-74, 85-89, 130-136.
Hiramoto Hiroo
Ohbayashi Gentaro
Umemoto Susumu
Hamilton Cynthia
Kittle John E.
Toray Industries Inc.
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